Ibaraki-ken, Japan

Tsuyoshi Matsui


Average Co-Inventor Count = 11.0

ph-index = 2

Forward Citations = 107(Granted Patents)


Location History:

  • Dallas, TX (US) (1999)
  • Ibaraki-ken, JP (2001)

Company Filing History:


Years Active: 1999-2001

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2 patents (USPTO):Explore Patents

Title: Tsuyoshi Matsui: Innovator in Semiconductor Cleaning Solutions

Introduction

Tsuyoshi Matsui is a notable inventor based in Ibaraki-ken, Japan. He has made significant contributions to the field of semiconductor device production, particularly in the development of cleaning agents that enhance manufacturing processes. With a total of 2 patents, Matsui's work is pivotal in ensuring the efficiency and effectiveness of semiconductor fabrication.

Latest Patents

Matsui's latest patents include a cleaning agent for use in producing semiconductor devices and a process for producing semiconductor devices using the same. The cleaning agent is an aqueous solution that contains a fluorine-containing compound, a salt of boric acid, a water-soluble organic solvent, and optionally, a specific quaternary ammonium salt or a specific ammonium salt of an organic carboxylic acid. This innovative cleaning agent effectively removes polymeric deposits formed during the dry etching process without affecting the dimensions of the via holes and conductive line patterns. Additionally, he has developed a cleaning liquid that comprises a fluorine-containing compound, a water-soluble organic solvent, and an inorganic or organic acid. This cleaning liquid is designed to remove deposit polymers formed during dry etching while preserving the integrity of metallic and insulating films.

Career Highlights

Throughout his career, Matsui has worked with prominent companies, including Mitsubishi Gas Chemical, Inc. His expertise in semiconductor cleaning solutions has positioned him as a key figure in the industry. His innovative approaches have contributed to advancements in semiconductor manufacturing processes.

Collaborations

Matsui has collaborated with notable professionals in the field, including Hideto Gotoh and Tetsuo Aoyama. These collaborations have further enriched his work and contributed to the development of effective cleaning solutions for semiconductor devices.

Conclusion

Tsuyoshi Matsui's contributions to the semiconductor industry through his innovative cleaning agents and processes have made a significant impact on manufacturing efficiency. His work continues to influence the field, ensuring the production of high-quality semiconductor devices.

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