Ibaraki, Japan

Tsuyoshi Hayasaka

USPTO Granted Patents = 1 


Average Co-Inventor Count = 12.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

where 'Filed Patents' based on already Granted Patents

1 patent (USPTO):

Title: The Innovations of Tsuyoshi Hayasaka

Introduction

Tsuyoshi Hayasaka is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on the development of materials that enhance the performance of photovoltaic cells.

Latest Patents

Hayasaka holds a patent for a composition used in forming a passivation layer on semiconductor substrates. This patent includes a method for producing semiconductor substrates with a passivation layer, as well as a photovoltaic cell element and its production method. The composition comprises a compound represented by Formula (I): M(OR), where M includes metal elements such as Nb, Ta, V, Y, and Hf. Each R represents an alkyl group with 1 to 8 carbon atoms or an aryl group with 6 to 14 carbon atoms, and m is an integer from 1 to 5.

Career Highlights

Hayasaka is currently employed at Hitachi Chemical Company, Ltd., where he continues to innovate in the field of semiconductor materials. His work has been instrumental in advancing technologies that improve the efficiency of photovoltaic cells.

Collaborations

He has collaborated with notable colleagues, including Shuichiro Adachi and Masato Yoshida, to further enhance the research and development of semiconductor technologies.

Conclusion

Tsuyoshi Hayasaka's contributions to semiconductor technology and photovoltaic cell development highlight his role as an influential inventor in the industry. His innovative work continues to pave the way for advancements in energy efficiency and material science.

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