Omiya, Japan

Tsuyohsi Narabe

This inventor holds 1 USPTO granted patent. Top assignee: Nikon Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsuyohsi Narabe. Retrieved from https://idiyas.com/inventor/tsuyohsi-narabe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovations of Tsuyohsi Narabe

Introduction

Tsuyohsi Narabe is a notable inventor based in Ohmiya, Japan. He is recognized for his contributions to the field of exposure apparatus technology. His work has significantly impacted the development of advanced imaging systems.

Latest Patents

Tsuyohsi Narabe holds a patent for a "Scanning type exposure apparatus and exposure method." This innovation showcases his expertise in creating efficient and precise exposure systems, which are essential in various technological applications.

Career Highlights

Narabe is associated with Nikon Corporation, a leading company in imaging and optical products. His role at Nikon has allowed him to work on cutting-edge technologies that enhance imaging capabilities. With a total of 1 patent, he has made a mark in the industry through his innovative ideas.

Collaborations

Throughout his career, Narabe has collaborated with esteemed colleagues such as Masamitsu Yanagihara and Susumu Mori. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Tsuyohsi Narabe's contributions to the field of exposure apparatus technology exemplify the spirit of innovation. His work at Nikon Corporation and his patent achievements highlight his dedication to advancing imaging technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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