Company Filing History:
Years Active: 2014
Title: Tsutomu Shimayama: Innovator in Low Dielectric Constant Insulating Films
Introduction
Tsutomu Shimayama is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of materials science, particularly in the development of low dielectric constant insulating films. His innovative work has implications for various electronic applications.
Latest Patents
Shimayama holds a patent for a low dielectric constant insulating film and the method for forming the same. This patent discloses a low dielectric constant insulating film formed of a polymer containing silicon (Si) atoms, oxygen (O) atoms, carbon (C) atoms, and hydrogen (H) atoms. The film includes straight chain molecules in which a plurality of basic molecules with an SiO structure are linked in a straight chain, along with binder molecules that link these straight chain molecules. The area ratio of a signal indicating a linear type SiO structure is 49% or more, and the signal amount of the signal indicating Si(CH) is 66% or more. This innovation is crucial for enhancing the performance of electronic devices.
Career Highlights
Tsutomu Shimayama is affiliated with Tohoku University, where he continues to engage in research and development. His work has garnered attention for its potential to improve the efficiency and effectiveness of electronic components.
Collaborations
Some of his notable coworkers include Seiji Samukawa and Shigeo Yasuhara. Their collaborative efforts contribute to advancing research in the field of materials science.
Conclusion
Tsutomu Shimayama's contributions to the development of low dielectric constant insulating films highlight his role as an innovator in materials science. His patent and ongoing research at Tohoku University reflect his commitment to advancing technology in the electronics industry.