Tokyo, Japan

Tsutomu Ishikawa

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Lion Corporation. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsutomu Ishikawa. Retrieved from https://idiyas.com/inventor/tsutomu-ishikawa-jd45tngj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Tsutomu Ishikawa: Innovator in Laser Emission Materials

Introduction

Tsutomu Ishikawa is a prominent inventor based in Tokyo, Japan. He is known for his contributions to the field of laser technology, particularly in the development of innovative materials that enhance laser performance. His work has significant implications for various applications in technology and industry.

Latest Patents

Ishikawa holds a patent for a laser emission material that contains a solid laser active medium dispersed in a melt molded product matrix of a zeolite. This invention represents a significant advancement in the efficiency and effectiveness of laser systems.

Career Highlights

Tsutomu Ishikawa is associated with Lion Corporation, where he has been instrumental in driving research and development efforts. His expertise in materials science and laser technology has positioned him as a key figure in the company's innovation initiatives.

Collaborations

Ishikawa has worked alongside notable colleagues, including Nobuo Johna and Takeshi Kawabe. Their collaborative efforts have contributed to the advancement of laser technologies and materials.

Conclusion

Tsutomu Ishikawa's work in laser emission materials showcases his innovative spirit and dedication to advancing technology. His contributions continue to influence the field and inspire future developments in laser applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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