Tsutomu Banno

Tsutomu Banno is a notable inventor based in Shiga, Japan. He has made significant contributions to the field of cathode ray tube technology, holding a total of 3 patents. His work has focused on improving the performance and efficiency of color cathode ray tubes, which have been essential in display technology.

Latest Patents

Banno's latest patents include innovative designs aimed at enhancing the functionality of cathode ray tubes. One of his patents is for a shadow mask with specifically shaped apertures. This design addresses the issue of electron beam projection, which tends to curve in a banana-like shape, leading to a drop in color interference margin and loss margin. By curving the slot apertures in the opposite direction of the electron beam projection, Banno's invention allows for a straight projection onto the fluorescent screen.

Another significant patent is for a narrow neck CRT with a slot type shadow mask. This design features a vertical pitch of slots within 0.2 mm to 0.3 mm and a width of each bridging portion between 0.02 mm to 0.08 mm. The combination of this shadow mask with a neck tube of diameter between 20 mm to 25 mm enhances the overall performance of the color cathode ray tube.

Career Highlights

Tsutomu Banno has been associated with NEC Corporation, where he has contributed to various advancements in display technology. His expertise in the field has made him a valuable asset to the company and the industry as a whole.

Collaborations

Banno has worked alongside notable colleagues such as Soshi Fukao and Nobumitsu Aibara. Their collaborative efforts have furthered the development of innovative technologies in cathode ray tubes.

Conclusion

Tsutomu Banno's contributions to cathode ray tube technology through his patents and work at NEC Corporation highlight his role as an influential inventor in the field. His innovative designs continue to impact the display technology landscape.