Company Filing History:
Years Active: 2017
Title: Innovative Contributions of Tsung-Wei Chang
Introduction
Tsung-Wei Chang is an accomplished inventor based in Taichung, Taiwan. With a total of two patents to his name, he specializes in the development of advanced technologies in the field of film deposition systems. His contributions significantly enhance the efficiency and effectiveness of thermal management in manufacturing processes.
Latest Patents
Chang's latest patents include a "Substrate Carrier Unit for a Film Deposition Apparatus" and a "Film Deposition System Having a Substrate Carrier and a Cooling Device". The former patent describes a substrate carrier that encompasses an isolated space, filled with a phase transition material capable of absorbing thermal energy. This unique material has a melting point between 18°C and 95°C and facilitates a phase change from solid to liquid. This innovation helps in efficiently managing thermal energy within the substrate carrier.
The latter patent outlines a film deposition system that integrates a substrate carrier, film deposition device, transport device, and cooling device. Similar to the first patent, it incorporates a phase transition material within the substrate carrier, ensuring optimal performance by absorbing thermal energy and changing its phase as needed. The cooling device operates effectively to transition the phase of the material from liquid back to solid, demonstrating Chang’s emphasis on innovative thermal management solutions.
Career Highlights
Chang's professional journey is marked by his collaboration with Linco Technology Co., Ltd., a company known for its advancements in technology. His expertise in thermal energy management and film deposition systems positions him as a key player in the industry. Through his patents, he continues to contribute to the technological advancements in manufacturing processes, showcasing his commitment to innovation.
Collaborations
Throughout his career, Tsung-Wei Chang has worked closely with talented colleagues such as Cheng-Peng Yeh and Huei-Chia Su. Their collaborative efforts have driven advancements in their field, allowing them to tackle complex challenges in the realm of film deposition and thermal management technologies.
Conclusion
Tsung-Wei Chang's patents reflect his dedication to innovation and his expertise in developing efficient technologies. His contributions to the field of film deposition systems not only demonstrate his skills as an inventor but also underscore the importance of collaboration in driving technological progress. As he continues his work at Linco Technology Co., Ltd., the industry eagerly anticipates further advancements from this inventive mind.