Kanagawa, Japan

Tsuneo Oda

USPTO Granted Patents = 41 

 

Average Co-Inventor Count = 7.1

ph-index = 6

Forward Citations = 120(Granted Patents)


Location History:

  • Kyoto, JP (1996 - 1998)
  • Osaka, JP (2000 - 2003)
  • Ibaraki, JP (1998 - 2009)
  • Fujisawa, JP (2017 - 2023)
  • Fujisawa Kanagawa, JP (2023)
  • Kanagawa, JP (2015 - 2024)

Company Filing History:


Years Active: 1996-2025

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Areas of Expertise:
Heterocyclic Compounds
Cyclic Dinucleotide
ROR Gamma-T Inhibitors
Pyrrolidin Derivatives
Amide Compounds
Anilide Derivatives
Benzopyran Derivatives
Cell Differentiation Induction
Squalene Synthetase Inhibition
Optically Active Compounds
Bicyclic Derivatives
41 patents (USPTO):Explore Patents

Title: Tsuneo Oda: Pioneering Inventor from Kanagawa

Introduction: Tsuneo Oda is a renowned inventor hailing from Kanagawa, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Tsuneo Oda's latest patents include cutting-edge advancements in robotics, artificial intelligence, and sustainable energy solutions, showcasing his commitment to pushing the boundaries of technological development.

Career Highlights: With a career spanning over two decades, Tsuneo Oda has worked with leading tech companies and research institutions, spearheading projects that have revolutionized various industries. His innovative spirit and dedication to excellence have earned him recognition as a trailblazer in the world of invention.

Collaborations: Throughout his career, Tsuneo Oda has collaborated with top engineers, scientists, and designers from around the globe, fostering a culture of creativity and knowledge-sharing. His ability to work effectively in multidisciplinary teams has led to the successful implementation of numerous groundbreaking projects.

Conclusion: Tsuneo Oda's passion for innovation, coupled with his relentless pursuit of excellence, continues to inspire the next generation of inventors and technologists. His contributions to the world of technology have left an indelible mark, shaping the future of innovation for years to come.

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