Tokorozawa, Japan

Tsuneo Kobayashi

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsuneo Kobayashi. Retrieved from https://idiyas.com/inventor/tsuneo-kobayashi-t76tert8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Tsuneo Kobayashi: Innovator in Semiconductor Manufacturing

Introduction

Tsuneo Kobayashi is a notable inventor based in Tokorozawa, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent.

Latest Patents

Kobayashi holds a patent for a "Process for manufacturing semiconductor integrated circuit device." This patent describes a wafer manufacturing process that includes testing the semiconductor wafer at a unit of chip each time a predetermined treating step is performed. The test results are fed to a computer control system, which restricts succeeding treatments or further testing of chips based on the test results and the predetermined number of chips to be produced. The process also accounts for losses created by defective chips and monitors excess chips to save time and manufacturing costs.

Career Highlights

Tsuneo Kobayashi is associated with Hitachi, Ltd., where he has been instrumental in advancing semiconductor technology. His work has contributed to more efficient manufacturing processes in the industry.

Collaborations

Kobayashi has collaborated with fellow inventor Kensuke Nakata, further enhancing the innovative efforts within their field.

Conclusion

Tsuneo Kobayashi's contributions to semiconductor manufacturing through his patented processes demonstrate his commitment to innovation and efficiency in technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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