Natori, Japan

Tsuneaki Orikasa

This inventor holds 1 USPTO granted patent. Top assignee: Nikon Corporation. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsuneaki Orikasa. Retrieved from https://idiyas.com/inventor/tsuneaki-orikasa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Tsuneaki Orikasa: Innovator in Substrate Housing Solutions

Introduction

Tsuneaki Orikasa is a notable inventor based in Natori, Japan. He has made significant contributions to the field of substrate housing, particularly with his innovative designs that address common issues such as dust accumulation and static electricity.

Latest Patents

Orikasa holds a patent for a "Case for housing a substrate." This invention is designed to limit the accumulation of dust due to static electricity while allowing visual access to the substrate. The case features a box-like structure with an open front end and a pivotally attached front lid. The substrate is housed within this case, which is constructed from synthetic resin formed with electrically conductive copolymer. Additionally, a portion of the case is made from transparent electrically conductive material, enhancing its functionality.

Career Highlights

Tsuneaki Orikasa is associated with Nikon Corporation, a leading company in imaging and optical products. His work at Nikon has allowed him to focus on innovative solutions that improve product performance and user experience.

Collaborations

Orikasa has collaborated with Kanefumi Nakahara, contributing to the development of advanced technologies in substrate housing.

Conclusion

Tsuneaki Orikasa's inventive spirit and dedication to improving substrate housing solutions have made a lasting impact in his field. His patent reflects a commitment to innovation that addresses practical challenges in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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