Sakai, Japan

Tsuneaki Hirashima


Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Sakai, JP (1983 - 1989)
  • Osaka, JP (1990)

Company Filing History:


Years Active: 1983-1990

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5 patents (USPTO):Explore Patents

Title: Tsuneaki Hirashima: Innovator in Photosensitive Technology

Introduction

Tsuneaki Hirashima is a notable inventor based in Sakai, Japan. He has made significant contributions to the field of photosensitive materials, holding a total of 5 patents. His work focuses on enhancing the properties of photosensitive members, which are crucial in various technological applications.

Latest Patents

Hirashima's latest patents include innovations such as a photosensitive member comprising a bisazo pigment. This invention relates to a photosensitive member containing a specific bisazo compound formed on an electrically conductive substrate. The compound is designed to improve photosensitivity and dispersibility. Another notable patent involves a photosensitive member that utilizes an azo pigment with an N-oxide heterocyclic structure as a photoelectrical charge-generating material. This innovation enhances dispersion stability and sensitivity properties in photosensitive applications.

Career Highlights

Throughout his career, Hirashima has worked with reputable organizations, including the Osaka Municipal Government and Minolta Camera Co., Ltd. His experience in these institutions has allowed him to develop and refine his innovative ideas in the field of photosensitive technology.

Collaborations

Hirashima has collaborated with several professionals in his field, including Masakazu Takata and Takamasa Ueda. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Tsuneaki Hirashima's contributions to photosensitive technology demonstrate his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving the functionality and efficiency of photosensitive materials.

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