The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 31, 1990

Filed:

Feb. 10, 1989
Applicant:
Inventors:

Masakazu Takata, Osaka, JP;

Takamasa Ueda, Osaka, JP;

Kimiyuki Ito, Osaka, JP;

Yuko Mikasa, Nishinomiya, JP;

Yuki Shimada, Osaka, JP;

Tsuneaki Hirashima, Osaka, JP;

Souichi Yamamoto, Himezi, JP;

Yoshio Ishino, Kyoto, JP;

Toshinobu Ohno, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
430 76 ; 430 58 ; 430 78 ;
Abstract

The present invention relates to a photosensitive member containing a specific bisazo compound described by general structural formula[I] and formed on an electrically conductive substrate; ##STR1## Wherein X is a hydrogen atom, halogen atom, alkyl radical, alkoxi radical, nitro radical or cyano radical; A is a diatomic radical selected from among the following: ##STR2## B is a coupler described by formulae [II] through [VI]; ##STR3## R is a hydrogen atom, halogen atom, alkyl radical, alkoxi radical, nitro radical or cyano radical; and Y is an aromatic carbocyclic residue or aromatic heterocyclic residue, each of which may have a substituent; G is a carbamoyl radical or sulfamoyl radical and may have a substituent; R.sub.1 is a hydrogen atom, alkyl radical, amino radical or carbamoyl radical, each of which may have a substituent, a carboxyl radical or cyano radical; M is an aryl group which may have a substituent, which is improved in photosensitivity and dispersibility.


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