Taipei, Taiwan

Tsu-Shiea Chen

This inventor holds 1 USPTO granted patent. Top assignee: Rcs Technology, LLC. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsu-Shiea Chen. Retrieved from https://idiyas.com/inventor/tsu-shiea-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1994

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Tsu-Shiea Chen: Innovator in Monitor Filter Screen Technology

Introduction

Tsu-Shiea Chen is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of technology, particularly with his innovative designs aimed at improving user experience with monitors.

Latest Patents

Tsu-Shiea Chen holds a patent for a "Monitor Filter Screen Mounting Device." This device features a mounting block and a slide block that is connected to the locating block by an adjusting screw. It is designed to hold a filter screen in front of a monitor using a suspension arm. The suspension arm has one end pivoted to a crossbar on the filter screen at the top, while the opposite end is pivotably mounted on a round head pivot bolt. The design allows for the filter screen's position to be adjusted both horizontally and vertically, providing flexibility and ease of use.

Career Highlights

Tsu-Shiea Chen is currently associated with RCS Technology, LLC, where he continues to develop innovative solutions in technology. His work focuses on enhancing the functionality and usability of monitor accessories, contributing to a better user experience.

Collaborations

(Section skipped due to space constraints.)

Conclusion

Tsu-Shiea Chen's contributions to monitor technology through his innovative patent demonstrate his commitment to improving user interaction with technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…