Tsu-Hui Su

Title: Tsu-Hui Su: Innovator in Semiconductor Technology

Introduction

Tsu-Hui Su is a prominent inventor based in Taipei City, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of fin-thinning processes. His innovative approach has led to the development of a patented method that enhances the efficiency of semiconductor manufacturing.

Latest Patents

Tsu-Hui Su holds a patent for a method titled "Reducing fin wriggling in fin-thinning process." This patent describes a process that includes depositing a silicon layer over a semiconductor region, forming dielectric isolation regions that extend into both the silicon layer and the semiconductor region, and recessing these dielectric isolation regions. The method ensures that a first portion of the silicon layer and a second portion of the semiconductor region protrude higher than the top surfaces of the dielectric isolation regions, thereby forming a semiconductor fin. The fin is then thinned, while retaining the first portion of the silicon layer after the thinning process. A gate stack is subsequently formed on the semiconductor fin.

Career Highlights

Tsu-Hui Su is currently employed at Taiwan Semiconductor Manufacturing Co., Ltd., a leading company in the semiconductor industry. His work focuses on advancing semiconductor fabrication techniques, which are crucial for the development of modern electronic devices.

Collaborations

Throughout his career, Tsu-Hui Su has collaborated with notable colleagues, including Ssu-Yu Liao and Chun-Hsiang Fan. These collaborations have fostered a productive environment for innovation and have contributed to the success of their projects.

Conclusion

Tsu-Hui Su's contributions to semiconductor technology exemplify the importance of innovation in the field. His patented method for reducing fin wriggling in the fin-thinning process showcases his expertise and commitment to advancing semiconductor manufacturing techniques.