Yilan, Taiwan

Tso-Chun Tony Wang

This inventor holds 2 USPTO granted patents. Top assignee: Mosel Vitelic Corporation. Active years: 2002-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tso-Chun Tony Wang. Retrieved from https://idiyas.com/inventor/tso-chun-tony-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 29(Granted Patents)


Location History:

  • Taichung, TW (2002)
  • Yi-Lan, TW (2003)

Company Filing History:


Years Active: 2002-2003

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2 patents (USPTO):Explore Patents

Title: **Inventor Spotlight: Tso-Chun Tony Wang**

Introduction

Tso-Chun Tony Wang is an accomplished inventor based in Yi-Lan, Taiwan. With a remarkable portfolio consisting of two patents, he has made significant contributions to the field of semiconductor technology.

Latest Patents

One of Wang's latest innovations is the **Apparatus and Process of Fabricating a Trench Capacitor**. This intricate process outlines several detailed steps, beginning with the deposition of a nitride masking layer over a substrate. It then involves forming a deep trench, followed by the creation of an oxide fill plug, doping a substrate region, and depositing various layers to ensure electrical conductivity. The meticulous approach results in a highly efficient trench capacitor.

Another notable patent is the **Method for Reducing Nitride Residue in a LOCOS Isolation Area**. This method consists of forming an isolation structure through a series of layers and etching solutions. By executing well-timed oxidation processes and careful removal of oxide layers, the technique aims to eliminate nitride residuals and enhance the integrity of semiconductor devices.

Career Highlights

Tso-Chun Tony Wang is currently employed at **Mosel Vitelic Corporation**, where he continues to innovate in the realm of semiconductor fabrication. His work reflects a deep commitment to advancing technology and improving manufacturing processes.

Collaborations

At Mosel Vitelic Corporation, Wang collaborates with other talented professionals, including Houng-Chi Wei and Wei-Sheng King. Their collective efforts foster an environment of creativity and innovation, leading to significant advancements in semiconductor technologies.

Conclusion

Tso-Chun Tony Wang stands as a notable figure in the world of inventions related to semiconductor technology. His contributions, highlighted by his patents and collaborative efforts, continue to impact the industry positively. As he advances in his career, the innovations he brings forth promise to redefine the landscape of semiconductor fabrication.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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