Company Filing History:
Years Active: 2013
Title: Tsing-Jen Chen: Innovator in Patterned Substrate Technology
Introduction
Tsing-Jen Chen is a notable inventor based in Daliao, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of methods for preparing patterned substrates. His innovative approach utilizes nano- and micro-particles, showcasing his expertise in this specialized area.
Latest Patents
Tsing-Jen Chen holds a patent for a method titled "Method for preparing patterned substrate by using nano- or micro-particles." This patent outlines a comprehensive process that includes several steps: providing a substrate with a photoresist layer, coating the photoresist layer with nano- or micro-particles to form a particle layer, exposing and developing the photoresist layer to create a patterned photoresist layer, and finally removing the particle layer. Additionally, the method allows for the patterned photoresist layer to be used as an etching template, resulting in a patterned substrate with multiple cavities.
Career Highlights
Tsing-Jen Chen is affiliated with National Central University, where he continues to advance his research and innovation in substrate technology. His work has garnered attention for its practical applications in various industries, including electronics and materials engineering.
Collaborations
Tsing-Jen Chen has collaborated with esteemed colleagues such as Chia-Hua Chan and Chia-Hung Hou. These partnerships have further enriched his research endeavors and contributed to the advancement of their shared field.
Conclusion
Tsing-Jen Chen's contributions to the field of patterned substrate technology exemplify his innovative spirit and dedication to research. His patent and ongoing work at National Central University highlight the importance of advancements in materials science.