The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
May. 18, 2010
Chia-hua Chan, Keelung, TW;
Chia-hung Hou, Kaohsiung, TW;
Tsing-jen Chen, Daliao Township, Kaohsiung County, TW;
Chii-chang Chen, Pingzhen, TW;
Chia-Hua Chan, Keelung, TW;
Chia-Hung Hou, Kaohsiung, TW;
Tsing-Jen Chen, Daliao Township, Kaohsiung County, TW;
Chii-Chang Chen, Pingzhen, TW;
National Central University, Jhongli, Taoyuan County, TW;
Abstract
A method for preparing patterned substrate by using nano- or micro-particles is disclosed, which comprises the following steps: (A) providing a substrate with a photoresist layer formed thereon; (B) coating a surface of the photoresist layer with plural nano- or micro-particles, to form a particle layer; (C) exposing and developing the photoresist layer to obtain a patterned photoresist layer; and (D) removing the particle layer. In addition, after the particle layer is removed, the method of the present invention further comprises: (E1) using the patterned photoresist layer as an etching template to etch the substrate; and (E2) removing the patterned photoresist layer to obtain a patterned substrate with plural cavities formed thereon.