Chia-Hung Hou

Title: Chia-Hung Hou: Innovator in Nanotechnology

Introduction

Chia-Hung Hou is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of nanotechnology, particularly in the development of methods for preparing patterned substrates. His innovative approach has the potential to impact various applications in electronics and materials science.

Latest Patents

Chia-Hung Hou holds a patent for a "Method for preparing patterned substrate by using nano- or micro-particles." This method involves several steps: providing a substrate with a photoresist layer, coating the photoresist layer with nano- or micro-particles to form a particle layer, exposing and developing the photoresist layer to create a patterned photoresist layer, and finally removing the particle layer. Additionally, the method includes using the patterned photoresist layer as an etching template to etch the substrate, resulting in a patterned substrate with multiple cavities.

Career Highlights

Chia-Hung Hou is affiliated with National Central University, where he continues to advance his research in nanotechnology. His work has garnered attention for its innovative techniques and practical applications in various fields.

Collaborations

Chia-Hung Hou collaborates with notable colleagues, including Chia-Hua Chan and Tsing-Jen Chen. Their combined expertise contributes to the advancement of research and development in their respective areas.

Conclusion

Chia-Hung Hou is a key figure in the field of nanotechnology, with a focus on innovative methods for substrate preparation. His contributions are paving the way for future advancements in technology and materials science.