Tseng-Lung Chen

Title: Innovations by Tseng-Lung Chen

Introduction

Tseng-Lung Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of wafer processing. His innovative approach has led to the development of a unique patent that enhances the efficiency of wafer handling.

Latest Patents

One of Tseng-Lung Chen's key patents is titled "Exposure for Performing Synchronized Off-Axis Alignment." This invention features an exposure system that includes at least two wafer pads designed to hold wafers simultaneously. The system allows for various tasks such as exposing, aligning, and loading or unloading wafers to be performed synchronously. The exposure apparatus comprises an exposing unit, a wafer supporting unit, and an alignment beam scan unit. The wafer-supporting unit is equipped with at least two wafer pads, while the alignment beam scan unit utilizes an interferometer to detect interference patterns created by alignment beams and marks on the wafers. This innovative design enables the simultaneous execution of tasks on each wafer pad.

Career Highlights

Tseng-Lung Chen is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his inventive skills to real-world applications, contributing to advancements in wafer processing technology.

Collaborations

Throughout his career, Tseng-Lung Chen has collaborated with esteemed colleagues such as Chih-Jen Chang and Ming-Sung Wu. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

In summary, Tseng-Lung Chen is a prominent inventor whose work in wafer processing has led to significant advancements in the semiconductor industry. His patent for synchronized off-axis alignment showcases his innovative spirit and dedication to improving technology.