Hsinchu, Taiwan

Tseng-Lung Chang

This inventor holds 4 USPTO granted patents and 15 published patent applications and 1 EPO patent. Top assignees: Hon Hai Precision Industry Co., Ltd., Solidedge Solution Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tseng-Lung Chang. Retrieved from https://idiyas.com/inventor/tseng-lung-chang-nxcsijv4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4 

 

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2026

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4 patents (USPTO):Explore Patents

Title: Tseng-Lung Chang: Innovator in Solid Electrolyte Technology

Introduction

Tseng-Lung Chang is an inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of solid electrolyte technology. Although he currently holds no granted patents, his work in this area is noteworthy.

Latest Patent Applications

Tseng-Lung Chang's latest patent applications include:

1. **Composite Solid Electrolyte and Method of Manufacturing the Same** - This application provides a composite solid electrolyte that includes a lithium lanthanum zirconium oxide particle and a protective layer containing lithium phosphate. The average particle size of the lithium lanthanum zirconium oxide particle is smaller than 500 nm and larger than 50 nm. The protective layer containing lithium phosphate covers the outer surface of the lithium lanthanum zirconium oxide particle.

2. **Method of Forming Solid-State Electrolyte Powder** - This application describes a method of forming a solid-state electrolyte powder. It includes forming a zirconium compound layer on an inner surface of a container, placing a precursor mixture on the zirconium compound layer, and performing an aerobic sintering process to create the solid-state electrolyte powder.

Conclusion

Tseng-Lung Chang is an innovative inventor whose work in solid electrolyte technology holds promise for future advancements. His latest patent applications reflect his commitment to developing new materials and methods in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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