This inventor holds 3 USPTO granted patents and 19 published patent applications and 1 EPO patent. Top assignees: Solidedge Solution Inc., Hon Hai Precision Industry Co., Ltd.. Active years: 2024-2026.
Company Filing History:
Years Active: 2024-2026
Title: Innovations of Tseng-lung Chang
Introduction
Tseng-lung Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of complex Si—C cathode base units. With a total of two patents to his name, Chang's work is at the forefront of innovation in energy storage technologies.
Latest Patents
Chang's latest patents include a complex Si—C cathode base unit that features a first order Si—C nanoparticle. This nanoparticle comprises a plurality of graphene pieces and complex monomers formed by nanometer scale silicide and a first high molecular material. The first high molecular material serves as a viscosity agent, combining the graphene pieces and complex monomers while creating buffer spaces between them. Additionally, a second high molecular material layer encloses the first order Si—C nanoparticle, which undergoes a calcination process to carbonize the carbohydrate within. The invention also includes a method for manufacturing these complex Si—C cathode base units, detailing steps such as pulverizing a graphene block, mixing materials, and calcining to form third order Si—C nanoparticles.
Career Highlights
Tseng-lung Chang is currently employed at Solidedge Solution Inc., where he continues to innovate and develop advanced materials for energy applications. His expertise in nanotechnology and materials science has positioned him as a key player in the industry.
Collaborations
Chang collaborates with fellow inventor Hong-zheng Lai, contributing to the advancement of their shared research interests and projects.
Conclusion
Tseng-lung Chang's innovative work in the field of complex Si—C cathode base units showcases his commitment to advancing energy storage technologies. His contributions are paving the way for future developments in this critical area.