Tsen H Lin

Title: Tsen H Lin: Innovator in Photoluminescence Technology

Introduction

Tsen H Lin is a notable inventor based in Dallas, TX (US), recognized for his contributions to the field of photoluminescence technology. With a total of 2 patents, he has made significant advancements that enhance the efficiency and effectiveness of photoluminescence emissions.

Latest Patents

Tsen H Lin's latest patents include an "Apparatus and method for generating photoluminescence emission lines from thin CaF.sub.2 films." This innovative method demonstrates the ability to produce photoluminescence emissions from thin calcium fluoride films grown on silicon or silicon/aluminum substrates. The technology showcases narrow emission linewidths and high emission intensities, even for films with a thickness as low as 0.2 micrometers. The preferred embodiment of this invention is doped with rare-earth elements such as Neodymium (Nd).

Another significant patent is the "Method for generating photoluminescence emission lines from transition," which shares similar characteristics and applications as the previous patent. This work further emphasizes the potential of thin CaF.sub.2 films in various technological applications.

Career Highlights

Tsen H Lin is currently employed at Texas Instruments Corporation, where he continues to innovate and contribute to advancements in photoluminescence technology. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of Tsen H Lin's notable coworkers include Shou-Kong Fan and Walter Marvin Duncan. Their collaborative efforts have likely contributed to the success of their projects and innovations.

Conclusion

Tsen H Lin's work in photoluminescence technology exemplifies the impact of innovative thinking in the field of materials science. His patents and contributions continue to pave the way for advancements in this area, showcasing the importance of research and development in driving technological progress.