Madison Heights, MI, United States of America

Tsehaye N Eyassu

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Henkel Ag & Company, Kgaa. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tsehaye N Eyassu. Retrieved from https://idiyas.com/inventor/tsehaye-n-eyassu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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3 patents (USPTO):Explore Patents

Title: Tsehaye N Eyassu: Innovator in Hazardous Material Application

Introduction

Tsehaye N Eyassu is a notable inventor based in Sterling Heights, MI (US). He has made significant contributions to the field of hazardous material application, showcasing his innovative spirit and technical expertise.

Latest Patents

Tsehaye holds a patent for an "Applicator for Hazardous Materials." This invention focuses on pen-type hazardous material applicators that are particularly useful in applying metal pretreatment material to intricate geometries. These include challenging areas such as blind holes, through holes, rivets, crevices, chamfers, counterbores, and countersinks, which are often difficult to access.

Career Highlights

Tsehaye is currently employed at Henkel AG & Company, KGaA, where he continues to develop and refine his innovative ideas. His work at Henkel has allowed him to contribute to advancements in material application technologies.

Collaborations

Throughout his career, Tsehaye has collaborated with talented coworkers, including Bashir M Ahmed and Omar Lufti Abu-Shanab. These collaborations have fostered a creative environment that encourages innovation and problem-solving.

Conclusion

Tsehaye N Eyassu exemplifies the spirit of innovation in hazardous material application. His contributions through his patent and work at Henkel AG & Company, KGaA highlight his commitment to advancing technology in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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