Tse-Ming Chen

Title: Innovations of Tse-Ming Chen

Introduction

Tse-Ming Chen is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of technology, particularly in the area of etching methods and microstructure devices. With a total of 3 patents, his work reflects a commitment to advancing scientific knowledge and practical applications.

Latest Patents

One of Tse-Ming Chen's latest patents is a "Method for Reactive Ion Etching." This method involves placing a film in a vacuum chamber, introducing an etching gas, and performing reactive ion etching for a specified duration. The process includes stopping the etching and extracting the remaining gas to achieve a high-clean state with a pressure below 0.1 Pa. These steps are repeated until a predetermined etching depth is reached. Another significant patent is titled "Device Comprising Physical Properties Controlled by Microstructure and Method of Manufacturing the Same." This invention relates to a device that has physical properties controlled by a microstructure. It includes a base layer with a patterned surface and a two-dimensional structure layer that conforms to the topography of the base layer, allowing for changes in physical properties based on the generated stress.

Career Highlights

Tse-Ming Chen is affiliated with National Cheng-Kung University, where he continues to engage in research and development. His work at the university has allowed him to explore innovative solutions and contribute to academic advancements in his field.

Collaborations

Some of his notable coworkers include Sheng-Chin Ho and Yu-Chiang Hsieh. Their collaborative efforts have likely enhanced the research output and innovation potential within their projects.

Conclusion

Tse-Ming Chen's contributions to technology through his patents and research at National Cheng-Kung University highlight his role as an influential inventor. His innovative methods and devices continue to impact the field positively.