Trung T Le

Title: Trung T Le: Innovator in Plasma Assisted Atomic Layer Deposition

Introduction

Trung T Le is a notable inventor based in Vancouver, WA (US). He has made significant contributions to the field of atomic layer deposition, particularly through his innovative methods for improving film properties during substrate processing.

Latest Patents

Trung T Le holds a patent titled "Method for RF compensation in plasma assisted atomic layer deposition." This patent addresses the challenges associated with depositing films on substrates processed in batches. As conditions within a reaction chamber change during the processing of additional substrates, various film properties may trend over the course of a batch. The methods described in his patent minimize these trends by adjusting the amount of RF power used throughout the batch, thereby enhancing the quality and consistency of the deposited films.

Career Highlights

Trung T Le is currently employed at Lam Research Corporation, a leading company in the semiconductor manufacturing equipment industry. His work focuses on advancing technologies that improve the efficiency and effectiveness of film deposition processes.

Collaborations

Throughout his career, Trung T Le has collaborated with esteemed colleagues, including Jun Qian and Frank Loren Pasquale. These collaborations have contributed to the development of innovative solutions in the field of atomic layer deposition.

Conclusion

Trung T Le's contributions to the field of plasma assisted atomic layer deposition exemplify his commitment to innovation and excellence. His patent and work at Lam Research Corporation highlight his role as a key figure in advancing semiconductor manufacturing technologies.