This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2000-2004.
Company Filing History:
Years Active: 2000-2004
Title: Truc T Tran: Innovator in Plasma Processing Technology
Introduction
Truc T Tran is a notable inventor based in Fremont, CA, who has made significant contributions to the field of plasma processing technology. With a total of 2 patents, Tran's work focuses on enhancing the efficiency and effectiveness of chemical vapor deposition processes.
Latest Patents
Tran's latest patents include a "Showerhead assembly for a processing chamber" and a "Reactor optimized for chemical vapor deposition of titanium." The showerhead assembly is designed to distribute gases within a processing chamber, featuring a cylindrical member with a faceplate that allows for relative movement under thermal stress. The reactor patent is particularly suited for plasma-enhanced chemical vapor deposition of titanium, utilizing TiCl.sub.4 as a precursor. This innovative reactor design includes a perforated showerhead faceplate and a blocker plate to ensure even distribution of the atomized precursor, while also incorporating features to confine plasma and minimize thermal flow.
Career Highlights
Truc T Tran is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has positioned him as a key player in advancing plasma processing technologies.
Collaborations
Tran has collaborated with several talented individuals, including Salvador P Umotoy and Anh Ngoc Nguyen, who is a woman. These collaborations have contributed to the innovative solutions developed in his patents.
Conclusion
Truc T Tran's contributions to plasma processing technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the field. His innovative designs continue to push the boundaries of chemical vapor deposition processes.