Tokyo, Japan

Tozawa Hitoshi


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1987

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Tozawa Hitoshi: Innovator in Photometric Technology

Introduction

Tozawa Hitoshi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of photometry, particularly through his innovative designs and patents. His work has been instrumental in advancing the technology used in light measurement.

Latest Patents

Tozawa holds a patent for a photometrical apparatus that features a first light receiving element and a second light receiving element. The second element is designed to be less sensitive to temperature and other environmental influences than the first. This invention allows for the calculation of a measured quantity of light from a subject using a specific formula that incorporates outputs from both light receiving elements.

Career Highlights

Tozawa is associated with Tokyo Kogaku Kikai Kabushiki Kaisha, where he has been able to apply his expertise in photometric technology. His work has led to advancements in the accuracy and reliability of light measurement devices.

Collaborations

Tozawa has collaborated with notable colleagues such as Yabusaki Kenji and Noda Akira. Their combined efforts have contributed to the development of innovative solutions in their field.

Conclusion

Tozawa Hitoshi's contributions to photometric technology exemplify the impact of innovation in scientific measurement. His patent and collaborative efforts continue to influence the industry positively.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…