This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Kogaku Kikai Kabushiki Kaisha. Active years: 1987.
Company Filing History:
Years Active: 1987
Title: Tozawa Hitoshi: Innovator in Photometric Technology
Introduction
Tozawa Hitoshi is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of photometry, particularly through his innovative designs and patents. His work has been instrumental in advancing the technology used in light measurement.
Latest Patents
Tozawa holds a patent for a photometrical apparatus that features a first light receiving element and a second light receiving element. The second element is designed to be less sensitive to temperature and other environmental influences than the first. This invention allows for the calculation of a measured quantity of light from a subject using a specific formula that incorporates outputs from both light receiving elements.
Career Highlights
Tozawa is associated with Tokyo Kogaku Kikai Kabushiki Kaisha, where he has been able to apply his expertise in photometric technology. His work has led to advancements in the accuracy and reliability of light measurement devices.
Collaborations
Tozawa has collaborated with notable colleagues such as Yabusaki Kenji and Noda Akira. Their combined efforts have contributed to the development of innovative solutions in their field.
Conclusion
Tozawa Hitoshi's contributions to photometric technology exemplify the impact of innovation in scientific measurement. His patent and collaborative efforts continue to influence the industry positively.