Nagoya, Japan

Toyoshiro Yoshida

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Toyoshiro Yoshida: Innovator in Lithography Coating Technologies

Introduction

Toyoshiro Yoshida is a prominent inventor based in Nagoya, Japan. He has made significant contributions to the field of lithography through his innovative methods and technologies. His work focuses on improving the quality of coating film-forming compositions, which are essential in the semiconductor manufacturing process.

Latest Patents

Yoshida holds a patent for a "Method for producing coating film-forming composition for lithography." This method involves a unique process of passing a liquid through a specially designed filter cartridge. The filter cartridge is created by layering various types of filtration base fabrics or winding them around a hollow inner tube. The fabrics used are non-woven materials that have metal-adsorbing groups chemically bonded to polyolefin fibers. This innovative approach significantly reduces the amount of metal impurities that can cause minute defects on wafers, thereby enhancing the overall quality of the lithography process.

Career Highlights

Yoshida is associated with Nissan Chemical Corporation, where he has been instrumental in advancing the company's research and development efforts in chemical technologies. His expertise in the field has led to the successful implementation of his patented methods, contributing to the company's reputation as a leader in the chemical industry.

Collaborations

Throughout his career, Yoshida has collaborated with talented individuals such as Tomoya Ohashi and Suguru Sassa. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies in the field of lithography.

Conclusion

Toyoshiro Yoshida's contributions to the field of lithography through his patented methods demonstrate his commitment to innovation and excellence. His work not only enhances the quality of semiconductor manufacturing but also showcases the importance of collaboration in driving technological advancements.

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