This inventor holds 1 USPTO granted patent. Top assignee: Fuji Photo Film Company, Limited. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Toyomichi Nakamura: Innovator in Cam Mechanism Technology.
Introduction
Toyomichi Nakamura is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of mechanical engineering, particularly in the development of cam mechanisms. His innovative designs have the potential to enhance the efficiency and performance of various mechanical systems.
Latest Patents
Nakamura holds a patent for a cam mechanism that features a unique design. The invention involves a face cam secured to a rotary shaft, which is rotated by a motor. A pressing cam, movable along the rotary shaft, presses a cam follower pin toward the cam face of the face cam. This design allows for a reduction in contact friction on the cam face and minimizes the load torque generated during motor operation. The press cam maintains a substantially constant force while remaining stationary, which eliminates uneven torque resulting from the cam follower's movement.
Career Highlights
Nakamura is currently employed at Fuji Photo Film Company, Limited, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the company's mechanical engineering capabilities. With a focus on practical applications, he strives to create solutions that improve operational efficiency.
Collaborations
Throughout his career, Nakamura has collaborated with talented individuals such as Yasuo Ueno and Masaaki Nomura. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Toyomichi Nakamura's contributions to the field of cam mechanisms exemplify the spirit of innovation. His patented designs not only enhance mechanical efficiency but also pave the way for future advancements in engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
