This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Paper Mills Limited. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Tosihiko Netsuko: Innovator in Photomask Technology
Introduction
Tosihiko Netsuko is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photomask technology, particularly through his innovative patent.
Latest Patents
Netsuko holds a patent for a photomask material and method of processing thereof. This invention is crucial for advancements in semiconductor manufacturing and optical applications. He has 1 patent to his name, showcasing his expertise in this specialized area.
Career Highlights
Tosihiko Netsuko is currently employed at Mitsubishi Paper Mills Limited. His work at this esteemed company has allowed him to develop and refine his inventions, contributing to the company's reputation in the industry.
Collaborations
Throughout his career, Netsuko has collaborated with notable colleagues, including Yoshihiro Kagawa and Noriyuki Kawai. These partnerships have fostered innovation and have been instrumental in the development of new technologies.
Conclusion
Tosihiko Netsuko is a key figure in the field of photomask technology, with a focus on innovative materials and processing methods. His contributions continue to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile