Company Filing History:
Years Active: 1994-1995
Title: Toshiya Takahashi: Innovator in Photopolymer Technology
Introduction
Toshiya Takahashi is an accomplished inventor from Kuroiso, Japan, with a significant contribution to the field of polymer science. With two patents to his name, Takahashi has developed innovative solutions that advance the capabilities of photosensitive materials in various applications.
Latest Patents
Among his latest inventions, Takahashi has developed a "Negative Type Photosensitive Electrodepositing Resin Composition." This composition comprises a polymer obtained by neutralizing a copolymer of acrylic or methacrylic acid with a basic organic compound. It includes a non-water-soluble monomer featuring multiple photopolymerizable unsaturated bonds, a non-water-soluble photoinitiator, and a benzotriazole derivative with carboxyl groups. This innovative formulation is effective in producing electrodeposited films with low voltage or current requirements while maintaining high resolution for resist pattern formation. Additionally, he has created a "Coating Composition and Process for Producing a Precoated Plate," which is characterized by its photopolymerizability and heat curability.
Career Highlights
Takahashi's career spans various roles in the industry, where he has applied his expertise in polymer technology. He has notably worked with prominent companies such as Dai Nippon Toryo Co., Ltd. and Hitachi Chemical Company, Ltd. His contributions have significantly impacted the development of advanced coating solutions.
Collaborations
Throughout his career, Takahashi has collaborated with industry professionals, including notable coworkers like Yoshihisa Nagashima and Sigeo Tachiki. These collaborations have fostered an environment of innovation and creativity, resulting in the advancement of technologies that serve various industrial applications.
Conclusion
Toshiya Takahashi exemplifies the spirit of innovation in the realm of polymer science. With his impactful patents and collaborations, he continues to influence the development of advanced materials that meet the evolving needs of technology and industry. His work not only enhances existing technologies but also paves the way for future advancements in photopolymer applications.