The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 1995

Filed:

Oct. 11, 1991
Applicant:
Inventors:

Sigeo Tachiki, Hitachi, JP;

Masahiko Hiro, Hitachi, JP;

Toshihiko Akahori, Hitachi, JP;

Takuro Kato, Hitachi, JP;

Hajime Kakumaru, Hitachi, JP;

Yoshitaka Minami, Hitachi, JP;

Yuhji Yamazaki, Otawara, JP;

Toshiya Takahashi, Kuroiso, JP;

Toshihiko Shiotani, Otawara, JP;

Yoshihisa Nagashima, Hiratsuka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; C25D / ; C08F / ;
U.S. Cl.
CPC ...
430286 ; 430285 ; 430287 ; 430324 ; 430908 ; 430910 ; 430917 ; 2041806 ; 2041814 ; 522 16 ;
Abstract

A negative type photosensitive electrodepositing resin composition comprising (a) a polymer obtained by neutralizing a copolymer of acrylic or methacrylic acid and having an acid number of 20 to 300 with a basic organic compound, (b) a non-water-soluble monomer having two or more photopolymerizable unsaturated bonds in the molecule, (c) a non-water-soluble photoinitiator, and (d) a benzotriazole derivative having one or more carboxyl groups, is effective for giving electrodeposited films with a low voltage or low electric current in a short time, and usable for forming resist patterns with high degree of resolution.


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