Tsukuba, Japan

Toshiya Itei

This inventor holds 1 USPTO granted patent. Top assignee: Nof Corporation. Active years: 2013.


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Toshiya Itei: Innovator in Silicone Monomer Technology

Introduction

Toshiya Itei is a notable inventor based in Tsukuba, Japan. He has made significant contributions to the field of ophthalmic devices through his innovative work on silicone monomers. His expertise and dedication to research have led to advancements that benefit the medical and optical industries.

Latest Patents

Toshiya Itei holds a patent for a silicone monomer that is characterized by high purity. This invention is particularly suitable for the manufacture of ophthalmic devices, including contact lenses. The silicone monomer is represented by a specific chemical formula, where Y represents an alkyl group with 1 to 4 carbon atoms, n is an integer ranging from 0 to 3, and a and b are integers of 0 or 1. R can be either a hydrogen atom or a methyl group. This innovation enhances the quality and performance of contact lenses produced from this monomer.

Career Highlights

Itei is currently associated with Nof Corporation, where he continues to develop and refine his inventions. His work has positioned him as a key figure in the field of silicone materials for medical applications. His commitment to innovation is evident in the quality of his research and the impact it has on the industry.

Collaborations

Toshiya Itei collaborates with talented individuals such as Ryota Kobayashi and Nobuyuki Yoshioka. These partnerships foster a creative environment that encourages the exchange of ideas and enhances the development of new technologies.

Conclusion

Toshiya Itei's contributions to silicone monomer technology exemplify the importance of innovation in the medical field. His work not only advances the manufacturing of ophthalmic devices but also showcases the potential of collaboration in driving technological progress.

Profile summary based on public USPTO records.
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