Company Filing History:
Years Active: 1981-1984
Title: Toshiro Nishimura: Innovator in Surfactant Chemistry
Introduction
Toshiro Nishimura is a notable inventor based in Wakayama, Japan. He has made significant contributions to the field of surfactant chemistry, holding three patents that showcase his innovative approach to chemical processes.
Latest Patents
Nishimura's latest patents include a novel 2-(α-substituted alkyl)-2-imidazoline and a process for producing it. This compound is represented by a specific general formula, wherein R1 denotes a C6-C20 alkyl or alkenyl group, and R2 signifies a C1-C4 alkyl group. This invention is recognized for its utility as an intermediate for useful surfactants and polymer modifiers. Another significant patent is for a novel α-substituted carboxylamidoamine, which is also represented by a general formula. In this case, R1 again represents a C6-C20 alkyl or alkenyl group, while R2 can be H or C2H4OH. This compound is valuable as a surfactant, demonstrating Nishimura's focus on practical applications in his inventions.
Career Highlights
Toshiro Nishimura is associated with Kao Soap Company, Ltd., where he has been able to apply his expertise in surfactant chemistry. His work has contributed to the development of innovative products that enhance the company's offerings in the market.
Collaborations
Nishimura has collaborated with notable coworkers such as Yutaka Yasuda and Kiyoshi Tsuchihashi. These partnerships have likely fostered a creative environment that encourages the exchange of ideas and advancements in their field.
Conclusion
Toshiro Nishimura's contributions to surfactant chemistry through his patents reflect his innovative spirit and dedication to advancing chemical processes. His work continues to impact the industry positively.