Abiko, Japan

Toshiro Ariga

This inventor holds 1 USPTO granted patent. Top assignee: Dainippon Ink and Chemicals, Incorporated. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiro Ariga. Retrieved from https://idiyas.com/inventor/toshiro-ariga-01dg03hg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Toshiro Ariga: Innovator in Polylactic Acid Composition

Introduction

Toshiro Ariga is a notable inventor based in Abiko, Japan. He has made significant contributions to the field of materials science, particularly in the development of polylactic acid compositions. His innovative work has implications for various applications, including sustainable materials.

Latest Patents

Toshiro Ariga holds a patent for a "Polylactic acid composition containing modifier." This invention features a modifier for polylactic acid that comprises a block polymer with specific properties. The polymer block satisfies the relationship (1): 7.80 ≤ σ/ρ < 8.54. This patent highlights his expertise in enhancing the performance of biodegradable materials.

Career Highlights

Ariga is associated with Dainippon Ink and Chemicals, Incorporated, where he has been able to apply his knowledge and skills in a professional setting. His work at the company has allowed him to focus on innovative solutions in the chemical industry.

Collaborations

Throughout his career, Toshiro has collaborated with esteemed colleagues such as Shouji Imamura and Takashi Mihara. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in their respective fields.

Conclusion

Toshiro Ariga's contributions to the field of polylactic acid compositions demonstrate his commitment to innovation and sustainability. His work continues to influence the development of eco-friendly materials, showcasing the importance of research and collaboration in driving progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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