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Years Active: 1993-2025
Title: The Innovative Contributions of Toshio Osawa
Introduction
Toshio Osawa is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of carbon nanotube technology. With a total of eight patents to his name, Osawa has made remarkable advancements in manufacturing methods and apparatuses that enhance the quality and yield of carbon nanotubes.
Latest Patents
Osawa's latest patents include a manufacturing apparatus and method for carbon nanotubes. This innovative production device allows for high-temperature heating of catalyst raw materials using a floating catalyst chemical vapor deposition (FCCVD) method. The device features a synthesis furnace for synthesizing carbon nanotubes, a catalyst raw material supplying nozzle, and a nozzle temperature adjusting unit. This setup enables the thermal decomposition of catalyst raw materials before they enter the synthesis furnace, resulting in high-density microscopic catalyst metal particles that facilitate the vapor growth of carbon nanotubes with small diameters. Another notable patent involves a method for simultaneously producing carbon nanotubes and hydrogen. This method utilizes a carbon source containing both carbon and hydrogen atoms, allowing for the synthesis of carbon nanotubes on a support while simultaneously generating hydrogen in a gas flow.
Career Highlights
Throughout his career, Toshio Osawa has worked with esteemed organizations such as the University of Tokyo and Hitachi Chemical Company, Ltd. His work in these institutions has significantly contributed to the advancement of materials science and nanotechnology.