This inventor holds 3 USPTO granted patents. Top assignees: Kabushiki Kaisha Toshiba, Toshiba Kikai Kabushiki Kaisha, Toshiba Machine Co., Ltd.. Active years: 1996-1997.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Numazu, JP (1996 - 1997)
- Shizuoka-ken, JP (1997)
Company Filing History:
2 out of 53,262 
2 out of 746 
1 out of 113 
Years Active: 1996-1997
Title: The Innovations of Toshio Oishi
Introduction
Toshio Oishi is a notable inventor based in Numazu, Japan. He has made significant contributions to the field of polishing apparatuses, holding a total of 3 patents. His work reflects a commitment to advancing technology in the manufacturing sector.
Latest Patents
One of his latest patents is a polishing apparatus designed to enhance the efficiency of wafer polishing. This apparatus includes a polishing mechanism for processing wafers taken from a cassette, an attaching-detaching device for handling the wafers, a cleaning device for the polished wafers, and a transportation device for moving the wafers between various components. The design features a working chamber divided into multiple compartments, each housing specific devices, and includes communication devices for connecting adjacent compartments. Additionally, the apparatus may incorporate controls for managing internal pressures and generating laminar airflow within the compartments.
Another significant patent is a polishing device that features a vertically oriented first column alongside a surface table. This device includes a second column that can be adjusted vertically through a lifting drive. An arm fitted with a polishing head is attached to the second column, and the entire system is powered by directly connected motors.
Career Highlights
Toshio Oishi has worked with prominent companies such as Toshiba Kikai Kabushiki Kaisha and Kabushiki Kaisha Toshiba. His experience in these organizations has allowed him to develop and refine his innovative ideas in polishing technology.
Collaborations
Throughout his career, Oishi has collaborated with talented individuals, including Masafumi Tsunada and Shoichi Shin. These partnerships have contributed to the successful development of his inventions.
Conclusion
Toshio Oishi's contributions to polishing technology demonstrate his innovative spirit and dedication to improving manufacturing processes. His patents reflect a deep understanding of the complexities involved in wafer polishing and highlight his role as a significant inventor in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile