Sagamihara, Japan

Toshio Nagashima

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tsc Corporation. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshio Nagashima. Retrieved from https://idiyas.com/inventor/toshio-nagashima-rhdurehl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Innovations of Toshio Nagashima

Introduction

Toshio Nagashima is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the field of polishing and cleaning technologies. His innovative approach has led to the development of a unique device that enhances the efficiency of polishing and cleaning processes.

Latest Patents

Toshio Nagashima holds a patent for a polishing and cleaning compound device. This device is designed to polish and clean a work piece in a series of steps. The process begins with cleaning while the polishing is being terminated. The device features a polishing unit with cylindrical polishing tools that grip and hold the work piece. These tools rotate to polish the work piece as it is transported by rollers. Additionally, a cleaning unit utilizes a circular transporting mechanism to clean the polished work pieces.

Career Highlights

Toshio Nagashima has dedicated his career to advancing polishing and cleaning technologies. His work at TSC Corporation has allowed him to focus on developing innovative solutions that improve manufacturing processes. His patent reflects his commitment to enhancing efficiency and effectiveness in industrial applications.

Collaborations

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Conclusion

Toshio Nagashima's contributions to polishing and cleaning technologies exemplify the impact of innovation in manufacturing. His patented device represents a significant advancement in the field, showcasing his expertise and dedication to improving industrial processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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