Osaka, Japan

Toshio Minamigawa

This inventor holds 1 USPTO granted patent. Top assignee: Honjo Sorex Co., Ltd. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshio Minamigawa. Retrieved from https://idiyas.com/inventor/toshio-minamigawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: The Innovations of Toshio Minamigawa

Introduction

Toshio Minamigawa is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of materials science, particularly in the production of glass substrates. His innovative approach has led to advancements that are essential in various technological applications.

Latest Patents

Minamigawa holds a patent for a process for the production of a glass substrate coated with a finely patterned Nesa glass membrane. This process involves a sequence of steps that ensure the glass substrate is effectively coated, enhancing its functionality and application in various industries. He has 1 patent to his name, showcasing his expertise and commitment to innovation.

Career Highlights

Throughout his career, Minamigawa has worked with Honjo Sorex Co., Ltd., a company known for its advancements in glass technology. His role at the company has allowed him to explore and develop new methods that push the boundaries of what is possible in glass production.

Collaborations

Minamigawa has collaborated with esteemed colleagues such as Gohei Yoshida and Johji Matsumura. These partnerships have fostered an environment of creativity and innovation, leading to the development of cutting-edge technologies in their field.

Conclusion

Toshio Minamigawa's contributions to the field of glass substrate production highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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