Tokyo, Japan

Toshio Hatayama

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Solvay Specialty Polymers USA, LLC. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshio Hatayama. Retrieved from https://idiyas.com/inventor/toshio-hatayama-1pyatkvd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Toshio Hatayama: Innovator in Polyester Polymer Compositions

Introduction

Toshio Hatayama is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of polymer science, particularly in the development of polyester polymer compositions. His innovative work has implications for various applications, including light-emitting diode (LED) components.

Latest Patents

Toshio Hatayama holds a patent for polyester polymer compositions. This patent describes compositions that include a polyester polymer, a white pigment, and hydroxyapatite. It was surprisingly discovered that these compositions maintain outstanding retention of reflectance after prolonged exposure to heat and light. Additionally, they exhibit significantly reduced microblistering and increased mechanical performance compared to analogous polyester polymer compositions that include a non-calcium phosphate salt.

Career Highlights

Toshio Hatayama is associated with Solvay Specialty Polymers USA, LLC, where he continues to advance his research and development efforts. His work in this company has allowed him to explore innovative solutions in polymer technology.

Conclusion

Toshio Hatayama's contributions to polyester polymer compositions highlight his role as a key innovator in the field. His patented work not only enhances the performance of materials but also opens new avenues for their application in modern technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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