Toshio Fukasawa

Title: The Innovations of Toshio Fukasawa

Introduction

Toshio Fukasawa is a notable inventor based in Ebina, Japan. He has made significant contributions to the field of optical imaging and projection exposure devices. With a total of 2 patents to his name, Fukasawa's work has advanced the technology used in various imaging applications.

Latest Patents

Fukasawa's latest patents include a projection exposure device and an optically imaging method and apparatus. The projection exposure device is designed to transmit exposure light through a mask with a predetermined pattern. This device focuses the mask pattern onto an exposure member, ensuring high accuracy and throughput. The innovative design allows for the exposure member to be held vertically, minimizing heat effects from the light source and reducing the overall size and cost of the device.

The optically imaging method and apparatus involve a complex optical lens system that produces high-contrast images with good telecentricity. By moving specific lenses in unison, Fukasawa's method allows for magnification adjustments without the need for extensive corrections, streamlining the imaging process.

Career Highlights

Fukasawa has built a successful career at Nippon Seiko Kabushiki Kaisha, where he has been instrumental in developing cutting-edge optical technologies. His expertise in projection systems and imaging methods has positioned him as a key figure in the industry.

Collaborations

Throughout his career, Fukasawa has collaborated with talented individuals such as Minoru Takubo and Tatsuo Yamanaka. These partnerships have fostered innovation and contributed to the advancement of optical technologies.

Conclusion

Toshio Fukasawa's contributions to the field of optical imaging and projection exposure devices highlight his innovative spirit and technical expertise. His patents reflect a commitment to enhancing imaging technology, making a lasting impact in the industry.