Yokohama, Japan

Toshimitsu Shibata


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Innovations of Toshimitsu Shibata

Introduction

Toshimitsu Shibata is a notable inventor based in Yokohama, Japan. He is recognized for his contributions to the field of heat treatment technology, particularly in the semiconductor industry. His innovative designs have significantly impacted the efficiency and effectiveness of heat treating devices.

Latest Patents

One of Toshimitsu Shibata's key patents is a heat treating device. This device includes a processing vessel designed to expose objects, such as semiconductor wafers, to heat treatment. It features processing gas introduction nozzles for the introduction of processing gases, a cap for securely closing the processing vessel, and a heat retention cylinder that supports the wafer boat. The design allows for high intra-plane film thickness uniformity without the need to rotate the wafer boat. This innovation is crucial for enhancing the quality of semiconductor manufacturing.

Career Highlights

Throughout his career, Toshimitsu Shibata has worked with prominent companies in the semiconductor industry. He has been associated with Tokyo Electron Limited and Tokyo Electron Tohoku Limited, where he contributed to various advancements in semiconductor technology. His work has been instrumental in developing more efficient manufacturing processes.

Collaborations

Toshimitsu Shibata has collaborated with several talented individuals in his field. Notable coworkers include Toshiaki Miyaju and Naoya Kaneda, who have also made significant contributions to semiconductor technology.

Conclusion

Toshimitsu Shibata's innovative work in heat treating devices has made a lasting impact on the semiconductor industry. His patents and collaborations reflect his dedication to advancing technology in this critical field.

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