Company Filing History:
Years Active: 2021
Title: The Innovations of Toshimasa Nagoshi
Introduction
Toshimasa Nagoshi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology. His work focuses on developing advanced materials and methods that enhance the performance and reliability of semiconductor packages.
Latest Patents
Nagoshi holds a patent for a photosensitive element, laminate, permanent mask resist, method for producing the same, and method for producing semiconductor packages. This innovative photosensitive element includes a support film and a photosensitive layer formed from a photosensitive resin composition. Notably, the surface roughness of the support film that contacts the photosensitive layer ranges from 200 to 4,000 nm. This patent showcases his expertise in creating materials that are essential for modern electronics.
Career Highlights
Throughout his career, Nagoshi has been associated with Showa Denko Materials Co., Ltd., a leading company in the materials industry. His work has contributed to advancements in semiconductor technology, making him a valuable asset to his organization.
Collaborations
Nagoshi has collaborated with notable colleagues, including Shigeo Tanaka and Shizu Fukuzumi. These partnerships have fostered innovation and have led to the development of cutting-edge technologies in their field.
Conclusion
Toshimasa Nagoshi's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future innovations.