Company Filing History:
Years Active: 2004
Title: Toshiki Miyake: Innovator in Semiconductor Technology
Introduction
Toshiki Miyake is a prominent inventor based in Kawasaki, Japan. He is known for his significant contributions to the field of semiconductor technology. With a focus on innovation, he has developed methods that enhance the performance and efficiency of semiconductor devices.
Latest Patents
Miyake holds a patent for a semiconductor device having a shallow junction and a fabrication process thereof. This invention involves introducing an impurity element into a silicon substrate through an ion implantation process. The energy is set to ensure that the depth of the junction formed in the silicon substrate is less than about 50 nm. The process also includes a step of removing an oxide film from the surface of the silicon substrate before ion implantation. This innovative approach has the potential to improve the performance of semiconductor devices.
Career Highlights
Toshiki Miyake is associated with Fujitsu Corporation, a leading company in the technology sector. His work at Fujitsu has allowed him to contribute to various advancements in semiconductor technology. His expertise and innovative mindset have made him a valuable asset to the company.
Collaborations
Miyake has collaborated with notable colleagues such as Masataka Kase and Mitsuaki Hori. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.
Conclusion
Toshiki Miyake's contributions to semiconductor technology exemplify the spirit of innovation. His patent and work at Fujitsu Corporation highlight his commitment to advancing the field. Through his efforts, he continues to shape the future of semiconductor devices.