Hitachi, Japan

Toshikazu Ono

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi Chemical Company, Ltd.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshikazu Ono. Retrieved from https://idiyas.com/inventor/toshikazu-ono-mtkqt2t0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 47(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Toshikazu Ono: Innovator in Electroconductive Materials

Introduction

Toshikazu Ono is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of electroconductive materials, particularly through his innovative patent work. His expertise and dedication to research have positioned him as a key figure in his industry.

Latest Patents

Toshikazu Ono holds a patent for a composite electroconductive powder and electroconductive paste, along with the process for its production. This invention showcases his commitment to advancing technology in electroconductive materials, which are essential in various applications.

Career Highlights

Ono is currently employed at Hitachi Chemical Company, Ltd., where he continues to develop and refine his inventions. His work at this esteemed company has allowed him to contribute to significant advancements in material science.

Collaborations

Throughout his career, Toshikazu Ono has collaborated with talented individuals such as Hideji Kuwajima and Shozo Yamana. These partnerships have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Toshikazu Ono's contributions to the field of electroconductive materials through his patent and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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