Toshikazu Ogisu

Title: Toshikazu Ogisu: Innovator in Pressure Control Technology

Introduction

Toshikazu Ogisu is a notable inventor based in Komaki, Japan. He has made significant contributions to the field of pressure control technology, holding a total of 2 patents. His work primarily focuses on devices that enhance the efficiency and functionality of semiconductor manufacturing processes.

Latest Patents

Ogisu's latest patents include a pressure control valve and a pulse shot-type flow rate control device. The pressure control valve is designed for opening and closing a circular outlet port that connects a vacuum chamber used in semiconductor manufacturing to an exhaust pump. This innovative valve unit features a hollow portion and is equipped with rubber heaters that enhance its performance.

The pulse shot-type flow rate control device consists of first and second shutoff valves, a tank, a pressure sensor, and a controller. This device is capable of performing multiple processes, where the controller manages the opening and closing of the shutoff valves based on pressure differences. It optimizes the filling time to achieve a target flow rate, showcasing Ogisu's expertise in flow rate control methods.

Career Highlights

Toshikazu Ogisu is currently employed at CKD Corporation, where he continues to develop innovative solutions in pressure control technology. His work at CKD Corporation has allowed him to collaborate with other experts in the field, further enhancing his contributions to the industry.

Conclusion

Toshikazu Ogisu is a prominent inventor whose work in pressure control technology has made a significant impact on semiconductor manufacturing. His innovative patents reflect his dedication to improving efficiency and functionality in this critical field.