Tokyo, Japan

Toshikazu Karino


Average Co-Inventor Count = 7.0

ph-index = 6

Forward Citations = 587(Granted Patents)


Location History:

  • Higashimurayama, JP (1992 - 1993)
  • Tokyo, JP (1995 - 2000)

Company Filing History:


Years Active: 1992-2000

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6 patents (USPTO):Explore Patents

Title: Toshikazu Karino - Innovator of Substrate Processing Technology

Introduction

Toshikazu Karino, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of substrate processing technology. With a portfolio of six patents, Karino’s innovations have significantly advanced the capabilities of substrate processing apparatuses, showcasing his expertise and commitment to enhancing industry standards.

Latest Patents

Karino’s latest inventions include state-of-the-art substrate transferring mechanisms utilized in substrate processing apparatuses. These patents detail the design of a substrate transfer chamber, equipped with an advanced substrate handling system. The system features an intermediate substrate holding chamber, multiple substrate holders, and dual substrate transfer robots that facilitate efficient substrate transfers between various chambers. His work optimizes the operation and efficiency of substrate processing, which is critical in semiconductor manufacturing.

Career Highlights

Toshikazu Karino is currently employed at Kokusai Electric Co., Ltd., where he focuses on developing cutting-edge technologies for substrate processing. His innovative designs and solutions have contributed to the company's reputation as a leader in semiconductor equipment manufacturing. Karino's significant number of patents solidifies his position as a key inventor in this technical domain, reflecting his dedication and ingenuity.

Collaborations

Throughout his career, Karino has collaborated with talented professionals such as Shoichiro Izumi and Ryoji Saito. These partnerships have fostered a creative environment where innovative ideas can flourish, leading to significant advancements in their respective fields. The collaborative efforts underline the collective drive to enhance substrate processing technologies, demonstrating the power of teamwork in achieving groundbreaking results.

Conclusion

In summary, Toshikazu Karino stands out as a vital figure in the realm of substrate processing technology. His six patents reflect his innovative spirit and commitment to progress in semiconductor manufacturing. As the industry continues to evolve, the contributions of inventors like Karino will remain essential in shaping the future of technology.

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