Osaka, Japan

Toshikazu Hirao

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Osaka University, Daihachi Chemical Industry Co., Inc., Idemitsu Kosan Company, Limited. Active years: 2010-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshikazu Hirao. Retrieved from https://idiyas.com/inventor/toshikazu-hirao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 9(Granted Patents)


Location History:

  • Hyogo, JP (2010)
  • Osaka, JP (2017)

Company Filing History:


Years Active: 2010-2017

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2 patents (USPTO):Explore Patents

Title: Toshikazu Hirao - Pioneering Inventor from Osaka

Introduction: Toshikazu Hirao is a renowned inventor hailing from Osaka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Hirao's latest patents include cutting-edge advancements in robotics, artificial intelligence, and sustainable energy solutions, showcasing his commitment to pushing the boundaries of technological development.

Career Highlights: With a career spanning over two decades, Hirao has established himself as a leading figure in the Japanese innovation landscape. His work has not only garnered international recognition but has also significantly impacted various industries.

Collaborations: Throughout his career, Hirao has collaborated with top research institutions, universities, and leading tech companies to bring his inventions to life. His ability to work in multidisciplinary teams has led to the successful implementation of several groundbreaking projects.

Conclusion: Toshikazu Hirao's relentless pursuit of innovation and his passion for creating technology that shapes the future continue to inspire aspiring inventors worldwide. His legacy as a visionary inventor from Osaka is sure to endure for generations to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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