Sousa, Japan

Toshikazu Hamaura

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Maintech Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshikazu Hamaura. Retrieved from https://idiyas.com/inventor/toshikazu-hamaura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations of Toshikazu Hamaura

Introduction

Toshikazu Hamaura is a notable inventor based in Sousa, Japan. He has made significant contributions to the field of nozzle technology, particularly in the design of nozzle caps for spraying chemical solutions. His innovative approach addresses common issues faced in industrial applications, particularly in the paper manufacturing process.

Latest Patents

Hamaura holds a patent for a nozzle cap, a nozzle device equipped with such a cap, and a method for spraying chemical solutions. The patent focuses on solving the problem of clogging in nozzle holes, which can occur with prolonged use. The invention features a unique structure that allows for efficient spraying of chemical solutions while minimizing the risk of clogging.

Career Highlights

Hamaura is associated with Maintech Co., Ltd., where he has been instrumental in developing advanced nozzle technologies. His work has contributed to improving the efficiency and reliability of chemical spraying in various industrial applications.

Collaborations

Hamaura collaborates with talented coworkers, including Hiroshi Sekiya and Tomohiko Nagatsuka. Their combined expertise enhances the innovative capabilities of their projects.

Conclusion

Toshikazu Hamaura's contributions to nozzle technology exemplify the importance of innovation in industrial applications. His patent addresses critical challenges in the field, showcasing his commitment to advancing technology for practical use.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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