Toshikazu Arihisa

Title: Innovations by Toshikazu Arihisa

Introduction

Toshikazu Arihisa is a notable inventor based in Kurume, Japan. He has made significant contributions to the field of substrate cleaning technology. With a total of 2 patents to his name, Arihisa continues to push the boundaries of innovation in his industry.

Latest Patents

Arihisa's latest patents include an innovative apparatus for cleaning both sides of a substrate. This apparatus incorporates a spin chuck designed to hold a substrate while preventing contact with at least a central portion of it. The design features a motor with a hollow shaft connected to the spin chuck, which transmits rotating force. Additionally, it includes a front-side cleaning mechanism for cleaning the surface of the substrate and a back-side cleaning mechanism for rinsing the back side of the substrate. The back-side cleaning mechanism is strategically positioned to face the back side of the substrate through the hollow portions of the hollow shaft.

Career Highlights

Arihisa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work focuses on developing advanced cleaning technologies that enhance the efficiency and effectiveness of substrate processing.

Collaborations

Throughout his career, Arihisa has collaborated with talented individuals such as Hiroki Taniyama and Satoshi Nakashima. These collaborations have contributed to the advancement of innovative solutions in their field.

Conclusion

Toshikazu Arihisa's contributions to substrate cleaning technology exemplify his commitment to innovation. His patents reflect a deep understanding of the challenges in the industry and a dedication to finding effective solutions. His work continues to influence the field and inspire future advancements.